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sputtering system A

Rapid warming heat treatment system (Rapid Thermal Processing System, referred to as RTP) is
unquestionable importance in the semiconductor manufacturing process. This technique has its origins in
a single wafer process and cluster systems (cluster system) the rise of the concept. Meanwhile, a number of
studies in recent years, this technology has been applied on a large area CIGS solar cells of selenium process.
Thus, RTP will also be key to the future with R2R production CIGS solar system process technology.

Sample size 6 inches
Sputter source size 3 inches
Number of sputtering source 2
Plasma generator types DC, RF
Exhaust system Turbo molecular pump+mechanical pump
Process Pressure Control 1 Torr ~ 10-3 Torr

Listed specifications for the standard equipment, all specifications can be made ​​according to customer needs change, please call or write jeff.hsieh @ hopevac.com, we will have professionals at your service.

廣繼科技有限公司

Kung-Chi Technology Co., Ltd.

(886) 2908-5786 Welcome to Contact Us.

No.10-1, Aly. 105, Ln. 514, Zhongzheng Rd., Xinzhuang Dist., New Taipei City 242, Taiwan.