Rapid warming heat treatment system (Rapid Thermal Processing System, referred to as RTP) is
unquestionable importance in the semiconductor manufacturing process. This technique has its origins in
a single wafer process and cluster systems (cluster system) the rise of the concept. Meanwhile, a number of
studies in recent years, this technology has been applied on a large area CIGS solar cells of selenium process.
Thus, RTP will also be key to the future with R2R production CIGS solar system process technology.
Sample size | 6 inches |
Sputter source size | 3 inches |
Number of sputtering source | 2 |
Plasma generator types | DC, RF |
Exhaust system | Turbo molecular pump+mechanical pump |
Process Pressure Control | 1 Torr ~ 10-3 Torr |
Listed specifications for the standard equipment, all specifications can be made according to customer needs change, please call or write jeff.hsieh @ hopevac.com, we will have professionals at your service.
Kung-Chi Technology Co., Ltd.
(886) 2908-5786 Welcome to Contact Us.No.10-1, Aly. 105, Ln. 514, Zhongzheng Rd., Xinzhuang Dist., New Taipei City 242, Taiwan.